High Vacuum Confocal Sputtering System is an instrument used to deposit materials with plasma media. This technology allows deposition of more than three materials at the same time. The working principle of this instrument is to bombard the target
Spesification
•Consists of three target receptacles, 2 DC and 1 RF
•Can deposit three targets at once
•Operates at 0.5-2 Pa . pressure
•Deposition with a max power of 500 W
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